Shinku

Pressure Welding of Metals in Ultra-high Vacuum

Masatake AKAIKE, Hiroyasu FUNAKUBO

1980 Volume 23 Issue 10 Pages 455-464
Published: October 20, 1980
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.23.455

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An Application of Micro-Computer to Auger Analysis

Osamu IIDA, Kazuyuki UEDA, Hatsjio HAHIMTO

1980 Volume 23 Issue 10 Pages 465-469
Published: October 20, 1980
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.23.465

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A personal computer is applied to Auger analysis by means of an energy analyser with 3-grid LEED-AES system in order to get a rapid scanning. The personal computer adopted here is PET 2001-8 (Commodore) which has a CPU of R6502 and 8K bite RAM. Signal from a lock-in-amp, against a step-like retarding potential was digitized by A/D converter or V/F converter in a certain sampling time. A software and hardware are shortly described. A quality of Auger spectra depends on a time constant of lock-in-amp., sampling time, the number of a moving average and so on. An example of an application of this system to an evaporating process of Ti/SUS304 is shown.

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Micro-computer Aided Auger Electron Spectroscopy

Shigetsu NAKANISHI, Nobuo FUKOKA, Tetsuo HORIGUCHI

1980 Volume 23 Issue 10 Pages 470-475
Published: October 20, 1980
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.23.470

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A data acquisition system including a micro-computer was applied to the Auger electron spectroscopy (AES) system with a retarding field analyzer. Improvement of S/N of Auger spectrum was effectively made by averaging methods which could eliminate not only the random noise but also the pulsive noise occurred unexpectedly. The normalization of data by the electron current of incident beam was also made simultaneously on the averaging process and this led to the high reproducibility of experimental results. The method of curve-fitting developed specially for our purposes was useful to determine the Auger peak height precisely.

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A Simple Analysis of Outgassing Process

Gen'ichi HORIKOSHI, Masanori KOBAYASHI

1980 Volume 23 Issue 10 Pages 476-479
Published: October 20, 1980
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.23.476

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Recently, some experimental results show that outgassing rate depends largely on the pumping speed of the system. For complete understanding of these facts, a simplified model was proposed. In the model, we consider only one kind of diffusion process from the inside of the bulk and one kind of adsorption and desorption processes with a sojourn time τ₁. Practically, we can only measure net outgassing rate, i.e., the difference of coming out flux and incident one to the surface. When a surface is exposed to the absolute vacuum, the incident flux is zero and the outgassing rate is equal to the coming out flux which is much larger than the practical outgassing rate. The analysis shows that the outgassing rate depends not only on the pumping speed of the system but also on the surface conditions such as the surface density of adsorbed gas molecules and their sojourn time and approaches finally to a value which depends only on the material after a very long time.

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Erratum to : Quantitative Analysis of the Composition for a-Si_xCi_1-x : H Alloys by XPS

1980 Volume 23 Issue 10 Pages 501
Published: 1980
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.23.10_501

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