Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 5, Issue 7
Displaying 1-5 of 5 articles from this issue
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  • Erratum
    1962 Volume 5 Issue 7 Pages 256
    Published: 1962
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.5.7_256
    JOURNAL FREE ACCESS
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  • Silicone
    Hideo MARUYAMA
    1962 Volume 5 Issue 7 Pages 262-269
    Published: July 20, 1962
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.5.262
    JOURNAL FREE ACCESS
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  • Working Fluids For Vapour Pumps
    Akio ITO
    1962 Volume 5 Issue 7 Pages 270-278
    Published: July 20, 1962
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.5.270
    JOURNAL FREE ACCESS
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  • Bakable Metal Ultra-High Vacuum System Using Oil Diffusion Pump
    Yukio ISHIBE, Hideo YAMADA
    1962 Volume 5 Issue 7 Pages 279-285
    Published: July 20, 1962
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.5.279
    JOURNAL FREE ACCESS
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    The characteristics of bakable metal ultra-high vacuum system using two oil diffusion pumps in series are presented. The construction of each parts in vacuum system : indium valve, liquid nitrogen trap with chevron baffle, freon baffle, metal sealed flange and etc are described in part I. The back diffusion of gas molecules against oil vapour streams from low vacuum side to high vacuum one is studied and effects of the degassing on final vacuum are discussed in part II. As the back diffusion using helium gas, the compression ratio Pf/PO (Pf : fore vacuum pressure, PO : high vacuum pressure) at different boiler in puts 430W, 540W are respectively 4.3 × 103 and 3 × 104. The ultra-high vacuum system has attained to the pressure of 10-10mmHg.
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  • Dielectric Properties of Vacuum-deposited SiO Films
    Hidenori HIROSE, Yasaku WADA
    1962 Volume 5 Issue 7 Pages 286-292
    Published: July 20, 1962
    Released on J-STAGE: January 28, 2010
    DOIhttps://doi.org/10.3131/jvsj.5.286
    JOURNAL FREE ACCESS
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    Dielectric dispersion of vacuum-deposited SiO films is measured with a transformer bridge at frequencies from 45 c/s to 180 kc/s. The deposition is done in most cases at a pressure of 3 × 10-5 mmHg and the rate of deposition is varied from 0.75 to 77.4 Å/sec by controlling the source temperature. The prepared films are found to be completely amorphous from X-ray diffraction. The thickness of the films is measured by the multiple beam interferometry, being about 1 micron in the present case.
    Two dielectric dispersions are generally observed in the measured range, one at several kilocycles per second and the other below 45 c/s. The intensity of both the dispersions decreases with decreasing deposition rate and with increasing air pressure during the deposition. The intensity is also diminished after the heat-treatment up to 180°C in air. Effect of the heat-treatment becomes saturated in one hour or so.
    All these phenomena are believed to be due to the oxidation of SiO films. Change in the optical transmission in blue and ultra-violet ranges measured for the same specimens is also interpreted in terms of the oxidation process. The activation energies for the dispersions are determined and possible molecular mechanisms associated with them are proposed.
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