Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 30, Issue 4
Displaying 1-4 of 4 articles from this issue
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  • Implanted Hydrogen Behaviour in Metals
    Kohji KAMADA, Akio SAGARA
    1987 Volume 30 Issue 4 Pages 163-174
    Published: April 20, 1987
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.30.163
    JOURNAL FREE ACCESS
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  • Preparation and Characterization of Magnetron-Sputtering Ag-Zn Thin Film for Optical Recording
    Katsumi NISHIMORI, Heizo TOKUTAKA, Toshiaki MURAO, Naganori ISHIHARA, ...
    1987 Volume 30 Issue 4 Pages 175-181
    Published: April 20, 1987
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.30.175
    JOURNAL FREE ACCESS
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    Thin film of Ag-Zn (about 50 at%Zn) binary alloy exhibits reversible color change between silver and pink depending on the thermal history of the film. The films can be used for optical recording with laser beam. We made characterization of the thin films prepared by magnetron sputtering with a two-component target of Ag and Zn sheets. The color strongly depended both on the composition and the crystal structure of the film deposited on the substrate at room temperature. The appearance of pink color occurred in the region of Zn composition between 46 and 58 at%. The large film area with pink color can be made by the reciprocating motion of substrate above the sputtering apparatus.
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  • On the Bridge Type Josephson Junctions Fabricated by rf Sputter Etching
    Toshinari GOTO
    1987 Volume 30 Issue 4 Pages 182-187
    Published: April 20, 1987
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.30.182
    JOURNAL FREE ACCESS
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    Fabrication process and the Josephson properties of Nb variable-thickness bridge (VTB) are presented. In order to form a very short length, slant evaporation on the step edge and succeeding rf sputter etching were used. The process was optimized to form damage free bridges. The consequent VTB's with the length of about 0.1 μm were found to have large IcRn product 400-500 μV and to operate as ideal Josephson junctions over a wide temperatue range, typically 4.2 K-6.5 K. The VTB's have potential use as voltage standard, SQUID, high frequency devices and so on.
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  • Fabrication Procedure of SNS Bridges by Shapes of Sputtering Deposition at Step Edge and Anodic Oxidization
    Hiroshi NAKANO, Takafumi AOMINE
    1987 Volume 30 Issue 4 Pages 188-193
    Published: April 20, 1987
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.30.188
    JOURNAL FREE ACCESS
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    We designed a new and simple fabrication procedure to get SNS bridges with short bridge lengths using direction of sputtering deposition and anodic oxidization. This procedure does not need electron-beam lithography and both deposition and etching can be done only by sputtering process. We fabricated two types of the SNS bridges using this procedure; respectively Nb-Nb (reduced critical temperature) -Nb bridges and Nb-Cu-Nb bridges. We have measured several characteristics on those bridges. The experimental results show that both types of bridge were Josephson junctions and the behaviors of Nb-Cu-Nb bridges were in good agreement with the Resistively Shunted Junction model with the electrical resistance near the critical current.
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