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Volume 37, Issue 8
Displaying 1-5 of 5 articles from this issue
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Tatsuo ASAMAKI, Toshio KIKUCHI, Keiji ISHIBASHI1994 Volume 37 Issue 8 Pages 617-620
Published: August 20, 1994
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSAiming at extremely high-vacuum (XHV, less than 1 × 10-8 Pa (7.5 × 10-11 Torr)) sputter deposition and atomic manipulation, a fast-cycle exhausting system capable of attaining XHV has been developed by assembling a main valve between a main chamber and a side chamber. The main chamber is exhausted by a bakeable cryopump, and the pumping characteristic is measured. Ultimate pressure is attained at less than 8 × 10-11 Pa (6 × 10-13 Torr) in the main chamber after 17 hours of baking at about 200°C and evacuation for 60 h, and 1 × 10-8 Pa (7.5 × 10-11 Torr) after evacuation for 60 h without any baking. In the actual system operation transferring a substrate from the side chamber to the main chamber, XHV is attained in 3 min, and 1 × 10-9 Pa (7.5 × 10-12 Torr) in 90 min. This system is expected to be very effective for thin-film deposition and atomic manipulation.View full abstractDownload PDF (549K) -
Tatsuya BANNO, Kazuhiro TSUZUKI, Akira KINBARA, Yukito NAKAGAWA, Tsuto ...1994 Volume 37 Issue 8 Pages 621-628
Published: August 20, 1994
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSSelf-bias potential and its distribution of a radio-frequency (RF) electrode have been measured in argon and helium plasma using probes penetrating the electrode. In the absence of the magnetic field the self-bias potential distribution is almost homogeneous at-150 V (RF power = 26 W) in Ar plasma. When the magnetic field (B =0.04 T) parallel to the electrode is applied, the mean value of the potential is reduced to-40 V and the gradient in the potential distribution occurs along the E× B direction. Rotation of the magnetic field at a frequency below 50 Hz is unable to reduce potential inhomogeneity, but this technique enables us to measure the potential distribution as a continuous function of the azimuthal angle. In helium plasma, another type of inhomogeneity parallel to the magnetic field occurs; this inhomogeneity can be reduced effectively by pulsed Ar gas injection. These data are discussed to show physical meaning and industrial applications.View full abstractDownload PDF (1195K) -
Nobuo NAKANO, Hiroyuki MATSUDA, Soichi OGAWA1994 Volume 37 Issue 8 Pages 629-633
Published: August 20, 1994
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSThe properties of thin gold film electrodes were studied to improve the sensitivity and stability of an electrochemical gas sensor for phosphine.
The thin gold film electrodes were prepared by ion plating on the surface of a PTFE (polytetrafluoroethylene) membrane that was etched by r. f. plasma in Ar gas under various conditions. We studied the relation between the characteristics of an electrochemical gas sensor and the preparative condition of the electrode. The results obtained in this experiment are summarized as follows :
(1) The surface texture of the PTFE after sputter-etching changes to a needle texture; hence the surface area is larger than that without sputter-etching.
(2) The optimum conditions of preparation of the electrode are as follows : etching r. f. power, 100 W; etching time, 10 min; thickness of gold layer, 3000Å.
(3) A phosphine gas sensor using this optimum thin gold film electrode maintained stable sensitivity for at least 200 days under normal conditions at room temperature.View full abstractDownload PDF (1231K) -
Setsuo NAKAO, Kazuo SAITOH, Masami IKEYAMA, Hiroaki NIWA, Seita TANEMU ...1994 Volume 37 Issue 8 Pages 634-638
Published: August 20, 1994
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSDownload PDF (913K) -
Tadao KANEKO, Mieko SAKURAI, Osamu NITTONO1994 Volume 37 Issue 8 Pages 639-643
Published: August 20, 1994
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSDownload PDF (1459K)
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