Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 42, Issue 5
Displaying 1-5 of 5 articles from this issue
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  • Measurement of the Spin-polarization of Secondary Electrons Excited by Reflection High Energy Electron Diffraction Field
    Kaoru IJIMA, Seigi MIZUNO, Kohji NAKAMURA, Saburo SHIMIZU, Koh FUWA, S ...
    1999 Volume 42 Issue 5 Pages 557-564
    Published: May 20, 1999
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.42.557
    JOURNAL FREE ACCESS
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    Combining RHEED system with an electron spin detector, we have observed the spin-polarization of secondary electrons emitted from the transition metal and alloy surfaces during the RHEED measurement for the first time. The strong temperature as well as angle dependences and the magnetic hysteresis give the evidence that the observed polarization reflects the magnetic domain structure at the surface.
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  • Measurement of ECR-CH4 Plasma using Langmuir Probe and an Optical Emission Spectroscopy
    Hiroshi INABA, Shigehiko FUJIMAKI
    1999 Volume 42 Issue 5 Pages 565-571
    Published: May 20, 1999
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.42.565
    JOURNAL FREE ACCESS
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    The electron energy distribution function, F (E) , in ECR-CH4 plasma was measured with the Langmuir probe technique. Increase in microwave power expanded tail of F (E) in the high energy region; the electron density of the high energy region (E> 20 eV) in methane plasma increased non-linearly against the power in the range between 100 W and 400 W. Peak intensities of Hα, Hβ, and CH* determined from optical emission spectra (370-670 nm) also increased non-linearly with microwave power. The behavior can be explained by contribution of high-energy tail of F (E) to the electron impact dissociation of CH3 radicals.
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  • Adsorption Structures of NO Molecules on a Pt (111) Surface
    Natsuo TATSUMI, Masuaki MATSUMOTO, Hideaki AIZAWA, Shinji TSUNEYUKI, K ...
    1999 Volume 42 Issue 5 Pages 572-576
    Published: May 20, 1999
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.42.572
    JOURNAL FREE ACCESS
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    Adsorption structures of NO molecules on a Pt (111) surface at low temperatures have been studied using low-energy electron diffraction (LEED). At 150 K a 2 × 2 LEED pattern appears at exposures higher than 0.2 L. With increasing exposure, the LEED spots get sharper, indicating two-dimensional island growth of adsorbed NO. The LEED I-V spectra measured at 0.4 L are different from those at 3 L, suggesting the presence of two kinds of 2 × 2 structure. The LEED I-V analysis performed for the 2 × 2 at 0.4 L strongly supports that NO is adsorbed at a threefold fcc hollow site. For the I-V curves of 2 × 2 at 3 L, the fcc hollow site model calculation does not fit the experimental I-V curve, suggesting that a different 2 × 2 structure grows after the first 2 × 2 structure is completed.
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  • Seeding Effect of Ti-layer on Lead Zirconate Titanate (PZT) Thin Films Deposited by Facing Target Sputtering
    Xin-Shan LI, Tsunehisa TANAKA, Yoshihiko SUZUKI
    1999 Volume 42 Issue 5 Pages 577-580
    Published: May 20, 1999
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.42.577
    JOURNAL FREE ACCESS
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    The PZT thin films with highly (111) oriented perovskite phase have been prepared on Ti-layer seeding platinized silicon at such a low substrate temperature as 200°C by facing target sputtering. The seeding mechanism of titanium layer and the crystallograghic characteristics of samples were investigated in this paper.
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  • Orientation Control of Potassium Niobate Thin Film Prepared by Sputtering
    Hidekazu HASHIMA, Akio KONISHI, Hajimu WAKABAYASHI, Yoji KAWAMOTO
    1999 Volume 42 Issue 5 Pages 581-584
    Published: May 20, 1999
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.42.581
    JOURNAL FREE ACCESS
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    Potassium niobate thin films were prepared on amorphous (SrO-SiO2) layer/Si wafer by means of RF magnetron sputtering using a (KNbO3+ K2CO3) mixed powder target. Amorphous (SrO-SiO2) layers under the potassium niobate thin films were prepared by means of RF magnetron sputtering using a (SrCO3 + SiO2) mixed powder target. Crystallization and orientation of the potassium niobate thin films depended on (KNbO3 + K2CO3) target compositions and amorphous (SrO-SiO2) layer target compositions under the potassium niobate thin films. The orientation of potassium niobate thin films could be controlled by a favorable choice of (KNbO3 + K2CO3) target compositions and amorphous (SrO-SiO2) layer target compositions, and produced highly [110] oriented perovskite type potassium niobate thin films.
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