Amorphous Si-C with H (
aSi
xC
1-x : H) alloy system formed in the gas mixture of Ar + 20% H
2 by r.f. sputtering method has been studied quantitatively by X-ray photoelectron spectroscopy (XPS). The composition
x has been obtained as a function of the fractional area (
A) of Si on the sputtering target by using epitaxial grown SiC films as a standard. As a result, the composition x can be approximately evaluated by the equation;
x =
A/ {
A + (1-A) ·ξ}, (ξ = 0.54), where ξ is the sputtering ratio of graphite to Si.
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