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Volume 37, Issue 6
Displaying 1-3 of 3 articles from this issue
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Osamu TSUKIDE, Mutsuo YAMASHITA, Tohru INOUE1994 Volume 37 Issue 6 Pages 499-506
Published: June 20, 1994
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSExperimental research carried out on a thin-film Ti-TiO2-Au device revealed the following. The device, after the electrical forming process, has a unique I-V property with unsymmetrical hysteresis loops. When a reverse bias voltage (the Au upper electrode becomes negative) is applied to the device, the peak value of the reverse voltage above the threshold voltage and its application period influence the growth of a high conduction state of the I-V property. The peak value of the forward voltage in a low conduction state and its application period control the subsequent I-V behavior in the reverse voltage region. The temperature dependence of the I-V curve was also examined. Finally, the source of the changes in the electrical conduction of the device is discussed in relation to the Ti whiskers growing in a void of the TiO2 layer, which were discovered during the examination.View full abstractDownload PDF (1077K) -
Joshin URAMOTO1994 Volume 37 Issue 6 Pages 507-513
Published: June 20, 1994
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSThe cylindrical plasma flow caused by dc discharge along a magnetic field is transformed into a sheet plasma flow (13 cm in width, 40 cm in length and about 3 mm in thickness) while electron components (up to 100 A) in the plasma flow are accelerated by a power supply of 80 V to 220 V. In the first experiment, the sheet plasma where an argon ion current density of 19 mA/cm2 is extracted is produced under an argon gas pressure of 1.3 × 10-1 Pa, an electron acceleration voltage VA = 100 V and an electron acceleration current IA = 50 A. In the second experiment, the sheet plasma is produced under an argon presuure of 5.3 Pa, VA =100 V and IA =100 A. In the third experiment, the sheet plasma is produced under a hydrogen gas pressure of 52 Pa, VA = 220 V and IA =100 A. These electron acceleration sheet plasmas are very useful for large-area and high-speed plasma processes. It should be noted that the ordinary vacuum conductance of the electron accelertion anode slit is greatly reduced to 1/8 of the original value when an electron acceleration current of 100 A enters the acceleration anode region through the slit.View full abstractDownload PDF (805K) -
Kenji OKADA, Kazue TAKAHASHI, Shinjiro UEDA1994 Volume 37 Issue 6 Pages 514-519
Published: June 20, 1994
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSAn ESD-TOF measuring system has been developed to operate in 10-10 Pa. The system is fabricated from commercial-grade type 304 stainless steel. It is evacuated by TMP and TSP, the latter having 99.99% pure titanium source to generate 6.5 × 10-10 Pa at room temperature without LN2. An electron gun and an ion detector (micro channel plate) were baked at more than 250°C and were defferentially evacuated independent of each other. When an electron beam of 300 eV and 0.5 microamperes was emitted continuously, the pressure rise was only 3 × 10-10 Pa. It took only about two seconds to obtain a clear ESD ion spectrum of 90, 000 times cumulation from a multicrystal titanium target when electron beam pulses of 100ns width, 300 eV and 0.5 microamperes were emitted at 50 kHz.View full abstractDownload PDF (730K)
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