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Volume 46, Issue 3
Displaying 51-51 of 51 articles from this issue
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Satoshi WATANABE, Teppei HIRAOKA, Satoshi HONDA, Takeshi TANAKA, Toshi ...2003Volume 46Issue 3 Pages 333-336
Published: March 20, 2003
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSPlasma source ion implantation (PSII) with high negative pulsed voltage applied to the workpiece is demonstrated as an effective low-temperature sterilization technique for three-dimensional work pieces. Using an N2 or Ar gas plasma and a pulsed voltage of -5 to -16 kV (10 μs pulse width, 900 pps), the method is shown to reduce the number of active Bacillus Pumilus spores by 3-5 log colony forming units after 15 min exposure.View full abstractDownload PDF (738K)