Damages of SiO
X layer on the SiO
X deposited nylon 6 film caused by the Gelboflex tests, abrasion, and creasing were examined by dyeing, AFM observation and measurements of H
2 permeation rates. The number and the extent of micro cracks on the SiO
X layer increased with the repetition of Gelboflex and the H
2 barrier property was deteriorated. Abrasion by the polishing paper caused a lot of long and deep scratches on the SiO
X layer and the H
2 barrier by SiO
X layer was almost completely lost. Even mild rubbing by the cotton cloth damages the SiO
X layer and the H
2 barrier property of SiO
X deposited nylon 6 film was more deteriorated with increasing number of rubbing. Creased SiO
X deposited nylon 6 films have micro cracks on the creased line. Such damages caused by the Gelboflex tests, abrasion, and creasing were less serious when the SiO
X layer on the SiO
X deposited nylon 6 film was laminated with a polyethylene film. Even though the micro crack was caused on the SiO
X layer by the large deformation, the polyethylene film laminated folds the SiO
X layer and hinders further progress of cracks.
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