Performance test of ion implantation system in tandetron MeV accelerator was investigated by measuring of dose and dose uniformity of implanted ion. The Au content of four samples which were cut from the alminum specimen were determined by a neutron activation analysis after implantation of 3.99 -5.1 MeV Au2+. The Au contents (DNAA) of samples were more than the Au doses (DICM) which were determined by current integration, because of charge changing of Au2+into lower. The dose uniformities were drifted, for reason of ion beam moving which occured in the Cs sputter ion source. From these finding, it was estimated that the doses increased 10% approximately and the dose uniformities had the error of 5% approximately as the ability of ion implantation system in tandetron MeV accelerator.
We developed a simple radiation protector that can be readily used in daily examination of nuclear medicine. This protector is an injector barrel shielded with lead. The leakage dose rate using this protector in examination with99mTc and201Tl as nuclides was 6-9%. This protector was not difficult to manipulate, and seemed to be practical for examination of nuclear medicine. In addition, use of a lead injector table reduced the exposure dose to lower body and the exposure dose at the time of bolus administration using a 3-way stop-cock.